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From Deep Trenches to Skyscrapers - Orthogonal Scaling with Dr. Subramanian S. Iyer (EDS/SSCS Joint Event)

Date
2012-05-23
Location
Webinar - Online
Contact
Mike Kelly, SSCS Exec. Dir – m.p.kelly@ieee.org
Description
May 23, 2012, 2:00PM Eastern US Time Abstract: The absence of cost effective lithography and patterning schemes is predicted to make the historical expectations of the cost –performance benefits of scaling (popularly known as Moore’s "Law") difficult to sustain. In this talk we introduce the concept of orthogonal scaling. Orthogonal scaling refers to features that can be added to the technology which significantly enhance the technology and which are sustainable over several generations of technology. This event is presented as a collaborative partnering with the Electron Device Society